ATOMICALLY FLAT III-ANTIMONIDE EPILAYERS GROWN USING LIQUID PHASE EPITAXY
نویسندگان
چکیده
منابع مشابه
Unintentionally doped InN grown onto an atomically flat AlN intermediate layer using plasma-assisted molecular beam epitaxy
1 Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan, R.O.C. 2 Department of Physics and Center for Nanoscience and Nanotechnology, National Sun Yat-Sen University, Kaohsiung, Taiwan, R.O.C. 3 Center for Condensed Matter Sciences, National Taiwan University, Taipei, Taiwan, R.O.C. 4 Material Science Center, National Tsing Hua University, Hsinchu, Tai...
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ژورنال
عنوان ژورنال: International Journal of High Speed Electronics and Systems
سال: 2004
ISSN: 0129-1564,1793-6438
DOI: 10.1142/s0129156404002624